Technology and performances of silicon oxynitride waveguides for optomechanical sensors fabricated by plasma-enhanced chemical vapour deposition

A. Sabac; C. Gorecki; M. Jozwik; L. Nieradko; C. Meunier; K. Gut

doi:10.2971/jeos.2007.07026

Journal of the European Optical Society - Rapid publications, Vol 2 (2007)

Technology and performances of silicon oxynitride waveguides for optomechanical sensors fabricated by plasma-enhanced chemical vapour deposition

A. Sabac, C. Gorecki, M. Jozwik, L. Nieradko, C. Meunier, K. Gut

Abstract

The technology and performances of a micromachined channel waveguides, based on PECVD deposition of silicon oxynitride (SiOxNy) thin films, is presented. The deposition parameters of the PECVD process are studied in connection with their optical, mechanical and chemical properties. Waveguide deign is optimized allowing single mode, low loss propagation and high efficiency of coupling with single mode optical fiber. The proposed technology is applied to fabricate the pigtailed Mach-Zehnder interferometers, where the coupling from optical fiber to waveguide is based on the etch of U-grooves, supporting fibers in the same substrate as the waveguide substrate.

Full Text: PDF

Citation Details

Cite this article

References

C. Gorecki, "Optical waveguides and silicon-based micromachined architectures" in MEMS and MOEMS - Technology and Applications, (SPIE Press, Bellingham, 2000).

M. Tabib-Azar, G. Beheim, "Modern trends in microstructures and integrated optics for communication, sensing, and actuation" Opt. Eng. 36, 1307 (1997).

K. E. Burcham, G. N. De Brabander, J. T. Boyd, "Micromachined silicon cantilever beam accelerometer incorporating an integrated optical waveguide" Proc. SPIE 1793, 12 (1992).

E. Bonnotte, C. Gorecki, H. Toshiyoshi, H. Kawakatsu, H. Fujita, K. Wörhoff, K. Hashimoto, "Guided wave acoustooptic interaction with phase modulation in a ZnO thin-film transducer on an Sibased integrated Mach-Zehnder interferometer" J. Lightwave Technol. 17, 35 (1999).

W. Huang, R. M. Shubair, A. Nathan, and Y. L. Chow, "The modal characteristics of ARROW structures" J. Lightwave Technol. 10, 1015 (1992).

K. Fischer, J Muller, R Hoffmann, F. Wasse and D. Salle, "Elastooptical properties of SiON layers in an integrated optical interferometer used as a pressure sensor" J. of Lightwave Technology 12 163 (1994).

M. Ohkawa, M. Izutsu, and T. Sueta, "Integrated optic pressure sensor on silicon substrate" Appl. Optics 28, 5153 (1989).

C. H. Henry, R. F. Kazarinov, H. J. Lee, K. J. Orlowsky, L. E. Katz, "Low loss Si3N4-SiO2 optical waveguides on Si" Appl. Optics 26, 2621 (1987).

W. Gleine, J. Müller, "Low-pressure chemical vapor deposition silicon_ oxinitride films for integrated optics" Appl. Optics 31, 2036 (1992).

M. Kawachi, "Silica waveguides on silicon and their application to integrated-optic components" Opt. Quant. Electron. 22, 391 (1990).

S. Valette, S. Renard, J.P. Jadot, P.Guidon, C. Erbeia, "Silicon-based integrated optics technology for optical sensor applications" Sensor. Actuator. A21-A23, 1087 (1990).

H. Bezzaoui, E. Voges, "Integrated optics combined with micromechanics on silicon" Sensor. Actuator. A29, 219 (1991).

C. Gorecki, F. Chollet, E. Bonnotte, H. Kawakatsu, "Silicon-based integrated interferometer with phase modulation driven by acoustic surface waves" Opt. Lett. 22, 1784 (1997).

S. M. Sze, VLSI Technology (McGraw-Hill, New York, 1988).

L. Nieradko, C. Gorecki, M. Józwik, A. Sabac, R. Hoffmann, A. Bertz, "Fabrication and optical packaging of an integrated Mach-Zehnder interferometer on top of a moveable micromirror" J. Microlith. Microfab. 5, 023009/1 (2006).

C. Gorecki, "Association of MEMS technology with Integrated Optics: demonstration of active membrane in-situ read-out by monolithic integration of silicon-based Mach Zehnder interferometer" Optica Pura y Applicada 38, 65 (2005).

K. Wörhoff, A. Driessen, P. V. Lambeck, L. T. H. Hilderink, P. W. C. Linders, Th. J. A. Popma "Plasma Enhanced Chemical Vapor Deposition Silicon Oxynitride for Application in Integrated Optics" Sensor. Actuator. 74, 9-12 (1999).

R. Germann, H.W.M. Salemink, R. Beyeler, G.L. Bona, F. Horst, I. Massarek and B.J. Offrein, "Silicon oxynitride layers for optical waveguide applications" J. Electrochemical Soc. 147, 2237 (1999).

W. A. Lanford, and M.J. Rand, "The hydrogen content of plasmadeposited silicon nitride" J. Appl. Phys. 49, 2473 (1978).

R. Chow, and R. S. Rosler, "Hydrogen content of a variety of plasma-deposited silicon nitrides" J. Appl. Phys. 53, 5630 (1982).

M. Jozwik, C. Gorecki, A. Sabac, P. Delobelle, and M. Kujawinska "Evaluation of micromechanical properties of buckled SiOxNy loaded membranes combining the Twyman-Green interferometry with nanoindentation and point-wise deflection technique" Opt. Laser. Eng. 41/5, 703 (2003).

C. Gorecki, A. Sabac, M. Józwik, S.S. Lee, "Characterisation of internal stress of silicon oxinitride thin films fabricated by plasmaenhanced chemical vapour deposition: applications in Integrated Optics" Proc. SPIE 4596, (2001).

M. Józwik, P. Delobelle, C. Gorecki, A. Sabac, L. Nieradko, C. Meunier, F. Munnik, "Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasmaenhanced chemical vapour deposition on silicon membranes" Thin Solid Films 468, 84 (2004).

C. M. M. Denisse, K. Z. Troost, J. B. Oude Elferink, F. H. P. M. Habraken, W. F. van der Weg, and M. Hendriks "Plasma-enhanced growth and composition of silicon oxynitride films" J. Appl. Phys. 60, 2536 (1986).