Journal of the European Optical Society - Rapid publications, Vol 7 (2012)

Microsized subsurface modification of mono-crystalline silicon via non-linear absorption

V. V. Parsi Sreenivas, M. Bülters, R. B. Bergmann


We introduce a novel method of optically inducing microsized subsurface structures using non-linear absorption of near infrared light in mono-crystalline silicon. We discuss the physical processes such as multi-photon absorption and self focussing in the material. The results presented in this paper demonstrate a new method of subsurface modifications in silicon and may open up novel avenues for optical devices embedded in silicon and optical process for the separation of wafers from their ingots.

© The Authors. All rights reserved. [DOI: 10.2971/jeos.2012.12035]

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