Three-grating monolithic phase-mask for the single-order writing of large-period gratings

Y. Bourgin; I. Vartiainen; Y. Jourlin; M. Kuittinen; F. Celle; S. Tonchev; O. Parriaux; T. Niemi

doi:10.2971/jeos.2011.11016s

Journal of the European Optical Society - Rapid publications, Vol 6 (2011)

Three-grating monolithic phase-mask for the single-order writing of large-period gratings

Y. Bourgin, I. Vartiainen, Y. Jourlin, M. Kuittinen, F. Celle, S. Tonchev, O. Parriaux, T. Niemi

Abstract

A new type of achromatic high-efficiency monolithic phase mask is presented. The mask comprises three submicron period diffraction gratings at a single substrate side that create a purely single spatial frequency interferogram of large period. The optical scheme is that of an integrated Mach-Zehnder interferometer where all light circulation functions are performed by diffraction gratings. The paper describes the operation principle of the phase mask, the fabrication process, and its utilization in a write-on-the-fly scheme for the writing of a long, 2 µm-period grating.

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References

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