Journal of the European Optical Society - Rapid publications, Vol 6 (2011)

Comparison of far field characterisation of DOEs with a goniometric DUV-scatterometer and a CCD-based system

M. Wurm, S. Bonifer, B. Bodermann, M. Gerhard


We have measured far field diffraction patterns of different diffractive optical elements at an illumination wavelength of 193 nm using a new type of goniometric DUV (deep ultraviolet) scatterometer, which has been developed and set up recently at the PTB, the national metrology institute of Germany. This system offers both a high dynamic range and angular resolution. The scatterometer is especially suitable to analyse weak background light like stray light and local variations of the diffraction patterns over the DOEs (diffractive optical element). The measurement results are compared with measurements using a CCD (charge-coupled device)-based imaging DOE measurement system from Carl Zeiss SMT. An excellent agreement is demonstrated.

© The Authors. All rights reserved. [DOI: 10.2971/jeos.2011.11015s]

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H. Levinson, Principles of lithography (Second Edition, SPIE Press, Bellingham, 2005).

S. D. Slonaker, "Visualizing the impact of the illumination distribution upon imaging and applying the insights gained" Proc. SPIE 6520, 65200V (2007).

M. Wurm, F. Pilarski, and B. Bodermann, "A new flexible scatterometer for critical dimension metrology" Rev. Sci. Instrum. 81, 023701 (2010).

M. Wurm, B. Bodermann, and F. Pilarski, "Metrology capabilities and performance of the new DUV scatterometer of the PTB" Proc. SPIE 6533, 65330H (2007)

M. Wurm, Über die dimensionelle Charakterisierung von Gitterstrukturen auf Fotomasken mit einem neuartigen DUVScatterometer (PhD thesis, University of Jena, 2008).