Low cost production of computer-generated holograms: from design to  optical evaluation

I. Moreno; A. MartÃ­nez-GarcÃ­a; L. Nieradko; J. Albero; C. Gorecki

doi:10.2971/jeos.2010.10011

Journal of the European Optical Society - Rapid publications, Vol 5 (2010)

Low cost production of computer-generated holograms: from design to optical evaluation

I. Moreno, A. MartÃnez-GarcÃa, L. Nieradko, J. Albero, C. Gorecki

Abstract

In this work we review some optical characterization methods useful for the low cost production of two phase level computer generated holograms (CGH). As an example, binary CGH are designed with an iterative Fourier transform algorithm (IFTA) and fabricated on a silicon master micromachining with a single step of selective dry etch of silicon dioxide (SiO2) layer. The CGH characterization is performed in three steps; a first one involves the application of spectroscopic ellipsometry measurements to accurately measure the thickness of the SiO2 layer. These results permit the evaluation of the relative complex reflectance between the two levels of the developed hologram as a function of the wavelength. In a second step, interference microscopy is applied to directly visualize the phase shift in the SiO2/Si binary phase profile. Finally, the performance and diffraction efficiency of the fabricated CGH is compared for various lasers with different wavelengths. These experimental measurements in these two last steps confirm with very good accuracy the results derived from the spectroscopic ellipsometry analysis. In conjunction, the combination of these well established optical techniques provides a precise optical characterization of binary diffractive optical elements produced with simple and low cost technique, useful for mass production.

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References

H. Herzig, Micro Optics (Taylor & Francis, London, 1997).

S. Sinzinger, and J. Jahns, Microoptics (Wiley-VHC, Weinheim, 1999).

B. Kress, and P. Meyrueis, Digital Diffractive Optics (John Wiley & Sons, Chichester, 2000).

H. Kim, K. Choi, and B. Lee, "Diffractive optic synthesis and analysis of light fields and recent applications" Jpn. J. Appl. Phys. 45, 6555-06575 (2006).

U. D. Zeitner, M. Banasch, and E.-B. Kley, "The making of a computer-generated hologram" Photon. Spectra 42, 58-61 (2008).

L. P. Lesem, P. M. Hirsch, and J. A. Jordan, "The kinoform: a new wavefront reconstruction device" IBM J. Res. Dev. 13, 1503-155 (1969).

A. J. Caley, M. Braun, A. J. Waddle, and M. R. Taghizadeh, "Analysis of multimask fabrication errors for diffractive optical elements" Appl. Opt. 46, 2180-2188 (2007).

D. C. O'Shea, J. W. Beletic, and M. Poutus, "Binary-mask generation for diffractive optical elements using microcomputers" Appl. Opt. 32, 2566-2572 (1993).

K. S. Urquhart, R. Stein, and S. H. Lee, "Computer-generated holograms fabricated by direct write of positive electron-beam resist" Opt. Lett. 18, 308-310 (1993).

M. J. Verheijen, "E-beam lithography for digital holograms" J. Mod. Optic. 40, 711-721 (1993).

H. C. Bolstad, T. Yatagai, and M. Seki, "Optimization of phase-only computer-generated holograms using an ion-exchange process" Opt. Eng. 31, 1259-1263 (1992).

M. Flury, A. Benatname, P. Gérad, P. C. Montgomery, J. Fontaine, T. Engel, J. P. Schunck, and E. Fogarassy, "Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics" Appl. Surf. Sci. 208, 238-244 (2003).

M. T. Flores-Arias, A. Castelo, C. Gómez-Reino, and G. F. de la Fuente, "Phase diffractive optical grating on glass substrates by laser ablation" Opt. Commun. 282, 1175-1178 (2009).

I. Moreno, C. Gorecki, J. Campos, and M. J. Yzuel, "Comparison of computer generated holograms produced by laser printers and lithography. Application to pattern recognition" Opt. Eng. 34, 3520- 3525 (1995).

C. Iemmi, S. Ledesma, J. Campos, and M. Villareal, "Gray-level computer-generated hologram filters for multiple-object correlation" Appl. Opt. 39, 1233-1240 (2000).

I. Moreno, C. Iemmi, A. Márquez, J. Campos, and M. J. Yzuel, "Modulation light efficiency of diffractive lenses displayed onto a restricted phase-mostly modulation display" Appl. Opt. 43, 6278- 6284 (2004).

A. W. Lohmann, and D. P. Paris, "Binary Fraunhofer holograms, generated by computer" Appl. Opt. 6, 1739-1748 (1967).

Y.-C. Chang, P. Zhou, and J. H. Burge, "Analysis of phase sensitivity for binary computer-generated holograms" Appl. Opt. 45, 4223- 4234 (2006).

P. Zhou, and J. H. Burge, "Fabrication error analysis and experimental demonstration for computer generated holograms" Appl. Opt. 46, 657-663 (2007).

A. Márquez, J. Campos, M. J. Yzuel, I. Pascual, A. Fimia, and A. Beléndez, "Production of computer-generated phase holograms using graphic devices: application to correlation filters" Opt. Eng. 39, 1612-1619 (2000).

S. Sinzinger, and V. Arrizón, "High-efficient detour-phase holograms" Opt. Lett. 22, 928-930 (1997).

C. Haupt, M. Pahlke, R. Krupka, and H. J. Tiziani, "Computergenerated microcooled reflection holograms in silicon for material processing with CO2 laser" Appl. Opt. 36, 4411-4418 (1997).

K. Hedsten, A. Magnusson, J. Melin, P. Enoksson, J. Bengtsson, F. Nikolajeff, D. Karlén, H. Rödjegård, and G. Andersson, "Replication of continuous-profiled micro-optical elements for silicon integration" Appl. Opt. 45, 83-89 (2006).

H. Fujiwara, "Principles of spectroscopic ellipsometry" in Spectroscopic Ellipsometry: Principles and Applications, 81-140 (John Wiley & Sons, Chichester, 2003).

A. Bosseboeuf, and S. Petitgrand, "Interference microscopy techniques for microsystem characterization" in Optical Inspection of Microsystems, W. Osten, ed., 217-244 (CRC Press, Boca Raton, 2007).

M. Skeren, I. Richter, and P. Fiala, "Iterative Fourier transform algorithm: comparison of various approaches" J. Mod. Optic. 49, 1851-1870 (2002).

J. S. Liu, A. J. Caley, and M. R. Taghizadeh, "Symmetrical iterative Fourier-transform algorithm using both amplitude and phase freedoms" Opt. Commun. 267, 347-355 (2006).

F. Wyrowski, "Diffractive optical elements: iterative calculation of quantized, blazed phase structures" J. Opt. Soc. Am. A 7, 961-969 (1990).

A. W. Lohmann, and S. Sinzinger, "Graphics codes for computer holography" Appl. Opt. 34, 3172-3178 (1995).

S. N. Toma, A. Alexandrescu, D. Muller, R. Muller, M. Kusko, N. Dumbravescu, V. Nascov, and D. Cojoc, "Binary phase reflective diffractive optical elements. Design and fabrication" (International Semiconductor Conference CAS 2004, Sinaia, Romania, IEEE CAS Proceedings, 2, 401-44, 4-6 October, 2004).

J. Albero, L. Nieradko, C. Gorecki, H. Ottevaere, V. Gomez, H. Thienpont, J. Pietarinen, B. Päivänranta, and N. Passilly, "Fabrication of spherical microlenses by a combination of isotropic wet etching of silicon and molding techniques" Opt. Express 17, 6283-6292 (2009).

J. A. Woollam, C. Bungay, L. Yan, D. Thomson, and J. Hilfinker, "Application of spectroscopic ellipsometry to the characterization of thin films" Proc. SPIE 4932, 393-404 (2003).

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, "Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation" J. Appl. Phys. 83, 3323-3336 (1998).

C. Gorecki, M. Józwik, and L. Salbut, "Multifunctional interferometric platform for on-chip testing the micromechanical properties of MEMS/MOEMS" J. Microlith. Microfab. 4, 041402 (2005).

C.-C. Wang, J.-Y. Lin, H.-J. Jian, and C.-H. Lee, "Transparent thinfilm characterization by using differential optical sectioning interference microscopy" Appl. Opt. 46, 7460-7463 (2007).

M. Schulz, A. Wiegmann, A. Márquez, and C. Elster, "Optical flatness metrology: 40 years of progress" Opt. Pura Apl. 41, 325-331 (2008).

J. N. Mait, A. Scherer, O. Dial, D. W. Prather, and X. Gao, "Diffractive lens with features less than 60 nm" Opt. Lett. 25, 381-383 (2000).

J. Vukusic, J. Bengtsson, M. Ghisoni, A. Larsson, C.-F. Carlström, and G. Landgren, "Fabrication and characterization of diffractive optical elements in InP for monolithic integration with surfaceemitting components" Appl. Opt. 39, 398-401 (2000).

S. Tamulevicius, A. Goubiene, G. Janusas, A. Palevivius, V. Ostasevivius, and M. Andrulevivius, "Optical characterization of diffractive optical elements replicated in polymers" J. Microlith. Microfab. 5, 013004 (2006).

A. Martínez, M. M. Sánchez-López, and I. Moreno, "Phasor analysis of binary amplitude gratings with different fill factor" Eur. J. Phys. 28, 805-816 (2007).

J. W. Goodman, Introduction to Fourier Optics (2nd Edition, McGraw-Hill, New York, 1996).

I. Moreno, J. Campos, C. Gorecki, and M. J. Yzuel, "Effects of amplitude and phase mismatching errors in the generation of a kinoform for pattern recognition" Jpn. J. Appl. Phys. 34, 6423-6432 (1995).

J. E. Ford, F. Xu, and Y. Fainman, "Wavelength-selective planar holograms" Opt. Lett. 21, 80-82 (1996).

J. Pietarinen, S. Siitonen, N. Tossavainen, J. Laukkanen, and M. Kuittinen, "Fabrication of Ni-shims using UV-moulding as an intermediate step" Microelectron. Eng. 83, 492-498 (2006).