Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

C. Gerhard; T. Weihs; A. Luca; S. Wieneke; W. Viöl

doi:10.2971/jeos.2013.13081

Journal of the European Optical Society - Rapid publications, Vol 8 (2013)

Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

C. Gerhard, T. Weihs, A. Luca, S. Wieneke, W. Viöl

Abstract

In this paper, surface smoothing of optical glasses, glass ceramic and sapphire using a low-power dielectric barrier discharge inert gas plasma at atmospheric pressure is presented. For this low temperature treatment method, no vacuum devices or chemicals are required. It is shown that by such plasma treatment the micro roughness and waviness of the investigated polished surfaces were significantly decreased, resulting in a decrease in surface scattering. Further, plasma polishing of lapped fused silica is introduced. Based on simulation results, a plasma physical process is suggested to be the underlying mechanism for initialising the observed smoothing effect.

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References

L. M. Cook, ”Chemical processes in glass polishing,” J. Non-Cryst. Solids 120, 152–171 (1990).

C. Buerhop, B. Blumenthal, R. Weissmann, N. Lutz, and S. Biermann, ”Glass surface treatment with excimer and CO2 lasers,” Appl. Surf. Sci. 46, 430–434 (1990).

H. Paetzelt, G. Böhm, and T. Arnold, ”Plasma jet polishing of rough fused silica surfaces,” in Proceedings to euspen 13th International Conference, 19–22 (euspen, Berlin, 2013).

J. Zhang, B. Wang, and S. Dong, ”Application of atmospheric pressure plasma polishing method in machining of silicon ultrasmooth surfaces,” Front. Electr. Electron. Eng. China 3, 480–487 (2008).

T. Arnold, G. Boehm, I.-M. Eichentopf, M. Janietz, J. Meister, and A. Schindler, ”Plasma Jet Machining - A novel technology for precision machining of optical elements,” Vakuum in Forschung und Praxis 22, 10–16 (2010), in German.

Y. X. Yao, B. Wang, J. H. Wang, H. L. Jin, Y. F. Zhang, and S. Dong, ”Chemical machining of Zerodur material with atmospheric pressure plasma jet,” CIRP Ann-Manuf. Techn. 59, 337–340 (2010).

H. L. Jin, B. Wang, and F. H. Zhang, ”Effect on surface roughness of zerodur material in atmospheric pressure plasma jet processing,” in Proc. SPIE 7655, 76552X (2010).

X. Li, T. Abe, and M. Esashi, ”Deep reactive ion etching of Pyrex glass using SF6 plasma,” Sensor. Actuator. A 87, 139–145 (2001).

L. Li, T. Abe, and M. Esashi, ”Smooth surface glass etching by deep reactive ion etching with SF6 and Xe gases,” J. Vac. Sci. Technol. B 21, 2545–2549 (2003).

S. Brückner, S. Rösner, C. Gerhard, S. Wieneke, and W. Viöl, ”Plasma-based ionisation spectroscopy for material analysis,” Mater. Test. 53, 639–642 (2011).

W. Viöl, S. Wieneke, S. Brückner, and R. Damm, ”Hollow funnelshaped plasma generator” Patent Application WO 2011/095245 (2011).

C. Gerhard, S. Roux, S. Brückner, S. Wieneke, and W. Viöl, ”Lowtemperature atmospheric pressure argon plasma treatment and hybrid laser-plasma ablation of barite crown and heavy flint glass,” Appl. Optics 51, 3847–3852 (2012).

J. Lawrence, and L. Li, ”Wettability characteristics of an Al2O3/SiO2- based ceramic modified with CO2, Nd:YAG, excimer and highpower diode lasers,” J. Phys. D Appl. Phys. 32, 1075–1082 (1999).

A. Gredner, C. Gerhard, S. Wieneke, K. Schmidt, and W. Viöl, ”Increase in generation of poly-crystalline silicon by atmospheric pressure plasma-assisted excimer laser annealing,” J. Mater. Sci. Eng. B 3, 346–351 (2013).

X. Li, L. Ling, X. Hua, M. Fukasawa, and G.S. Oehrlein, ”Effects of Ar and O2 additives on SiO2 etching in C4F8-based plasmas,” J. Vac. Sci. Technol. A 21, 284–293 (2003).

J. W. Coburn, and H. F. Winters, ”Ion- and electron-assisted gassurface chemistry–An important effect in plasma etching,” J. Appl. Phys. 50, 3189–3196 (1979).

I. Langmuir, ”Positive ion currents from the positive column of mercury arcs,” Science 58, 290–291 (1923).

N. Baguer, A. Bogaerts, Z. Donko, R. Gijbels, and N. Sadeghi, ”Study of the Ar metastable atom population in a hollow cathode discharge by means of a hybrid model and spectrometric measurements,” J. Appl. Phys. 97, 123305 (2005).

B. Niermann, R. Reuter, T. Kuschel, J. Benedikt, M. Böke, and J. Winter, ”Argon metastable dynamics in a filamentary jet microdischarge at atmospheric pressure,” Plasma Sources Sci. Technol. 21, 034002 (2012).

Y.-P. Zhao, G.-C. Wang, and T.-M. Lu, ”Surface-roughness effect on capacitance and leakage current of an insulating film,” Phys. Rev. B 60, 9157–9164 (1999).

H. E. Bennett, and J. O. Porteus, ”Relation between surface roughness and specular reflectance at normal incidence,” J. Opt. Soc. Am. 51, 123–129 (1961).