Broadband photonic crystal antireflection

M. Malekmohammad; M. Soltanolkotabi; A. Erfanian; R. Asadi; S. Bagheri; M. Zahedinejad; M. Khaje; M. H. Naderi

doi:10.2971/jeos.2012.12008

Journal of the European Optical Society - Rapid publications, Vol 7 (2012)

Broadband photonic crystal antireflection

M. Malekmohammad, M. Soltanolkotabi, A. Erfanian, R. Asadi, S. Bagheri, M. Zahedinejad, M. Khaje, M. H. Naderi

Abstract

Broadband antireflection layer have been fabricated by two dimensional (2D) photonic crystals (PCs) with tapered pillars on Si substrate. These PCs have been produced by interference lithography and reactive ion etching (RIE) techniques. The effect of depth and filling factor (FF) of the PCs on the reflectance magnitude and bandwidth has been investigated. The obtained reflectance was less than 1% in the broad spectral range from 400 to 2100 nm. Our numerically simulation shows the PC pillars slope has essential effect in the reduction of the reflection. However, our results show that the existence of RIE grasses in the PCs which are created in the RIE process have not been influenced in the performance of the antireflection layer which leads to simpler fabrication process.

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